Disorder-driven metal-insulator-transition assisted by interband Coulomb repulsion in a surface transfer doped electron system
Instituto de Ciencia de los Materiales, Universidad de Valencia - c/Dr. Moliner 50, 46100 Burjassot, Valencia, Spain, EU
Received: 17 September 2012
Accepted: 23 November 2012
The two-dimensional conducting properties of the Si(111) surface doped by the charge surface transfer mechanism have been calculated in the frame of a semiclassical Drude-Boltzmann model considering donor scattering mechanisms. To perform these calculations, the required values of the carrier effective mass were extracted from reported angle-resolved photoemission results. The calculated doping dependence of the surface conductance reproduces experimental results reported and reveals an intricate metallization process driven by disorder and assisted by interband interactions. The system should behave as an insulator even at relatively low doping due to disorder. However, when doping increases, the system achieves to attenuate the inherent localization effects introduced by disorder and to conduct by percolation. The mechanism found by the system to conduct appears to be connected with the increasing of the carrier effective mass observed with doping, which seems to be caused by interband interactions involving the conducting band and deeper ones. This mass enhancement reduces the donor Bohr radius and, consequently, promotes the screening ability of the donor potential by the electron gas.
PACS: 73.25.+i – Surface conductivity and carrier phenomena / 73.20.At – Surface states, band structure, electron density of states / 71.30.+h – Metal-insulator transitions and other electronic transitions
© EPLA, 2012