Redeposition during ion-beam erosion can stabilize well-ordered nanostructures
Institut für Theoretische Physik, Universität Münster - 48149 Münster, Germany
Received: 12 July 2013
Accepted: 8 October 2013
Using a continuum formulation valid for arbitrary laterally two-dimensional surface profiles, we investigate the significance of redeposition of ion-beam eroded particles on spatio-temporally evolving surface morphologies of the target. Combining the effect of redeposition with standard roughening and smoothing effects of ion-beam erosion processes to a generalized nonlocal Kuramoto-Sivashinsky equation, we substantiate the decisive role of redeposition for the emergence of well-ordered ion-beam eroded hexagonally arranged dot structures as, e.g., experimentally observed on various semiconductor targets.
PACS: 79.20.Rf – Atomic, molecular, and ion beam impact and interactions with surfaces / 81.15.Cd – Deposition by sputtering / 68.35.Ct – Interface structure and roughness
© EPLA, 2013