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First results of high-resolution patterning by the ENEA laboratory-scale extreme ultraviolet projection lithography system

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra and A. Torre

EPL, 84 5 (2008) 58003

DOI: https://doi.org/10.1209/0295-5075/84/58003

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