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How to use oxygen and atomic hydrogen to prepare atomically flat fcc Co(110) films

C. Tölkes, R. David, K. G. Tschersich, G. Comsa and P. Zeppenfeld

Europhys. Lett., 46 5 (1999) 589-594

DOI: https://doi.org/10.1209/epl/i1999-00304-5

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