EPL

Multiscale modeling of anisotropic wet chemical etching of crystalline silicon

M. A. Gosálvez, A. S. Foster and R. M. Nieminen

Europhys. Lett., 60 3 (2002) 467-473

Published online: 01 October 2002

DOI: 10.1209/epl/i2002-00287-1

M. A. Gosálvez

A. S. Foster

R. M. Nieminen

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