Polarization gradient light masks in atom lithography
Universität Konstanz, Fakultät für Physik
Optik Zentrum Konstanz, D-78457 Konstanz, Germany
Accepted: 27 January 1999
In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.
PACS: 32.80.Pj – Optical cooling of atoms; trapping / 42.50.Vk – Mechanical effects of light on atoms, molecules, electrons, and ions
© EDP Sciences, 1999