Amorphous thin-film growth: Theory compared with experiment
Institut für Physik, Universität Augsburg -
D-86135 Augsburg, Germany
Accepted: 14 January 2000
Experimental results on amorphous ZrAlCu thin-film growth and the dynamics of the surface morphology as predicted from a minimal nonlinear stochastic deposition equation are analysed and compared. Key points of this study are: i) an estimation procedure for coefficients entering into the growth equation and ii) a detailed analysis and interpretation of the time evolution of the correlation length and the surface roughness. The results corroborate the usefulness of the deposition equation as a tool for studying amorphous growth processes.
PACS: 68.35.Bs – Surface structure and topography / 61.43.Dq – Amorphous semiconductors, metals and alloys
© EDP Sciences, 2000