Fluctuation regimes of driven epitaxial surfacesC. A. Haselwandter and D. D. Vvedensky
The Blackett Laboratory, Imperial College - London SW7 2BW, UK
received 22 August 2006; accepted in final form 6 December 2006; published February 2007
published online 24 January 2007
We derive the Langevin equation for the random deposition and diffusion of surface particles during homoepitaxial growth. The coefficients in this equation are determined directly by the growth parameters (temperature and flux) and provide initial conditions for renormalization-group transformations that reveal a hierarchy of continuum equations along the trajectory of coarse-grained length and time scales. Excellent agreement with previous kinetic Monte Carlo simulations of the atomistic model is obtained for all length and time scales and values of the growth parameters, but our analytic method also allows the systematic study of the interplay between deposition and diffusion for general experimental input parameters.
81.15.Aa - Theory and models of film growth.
05.10.Gg - Stochastic analysis methods (Fokker-Planck, Langevin, etc.).
05.10.Cc - Renormalization group methods.
© Europhysics Letters Association 2007