Issue
EPL
Volume 81, Number 3, February 2008
Article Number 30006
Number of page(s) 6
Section General
DOI http://dx.doi.org/10.1209/0295-5075/81/30006
Published online 31 December 2007
EPL, 81 (2008) 30006
DOI: 10.1209/0295-5075/81/30006

Differential susceptibility to noise of mixed Turing and Hopf modes in a photosensitive chemical medium

S. Alonso1, D. G. Míguez2 and F. Sagués3

1  Abteilung Physikalische Chemie, Fritz-Haber-Institut der Max-Plank-Gesellschaft - 14195 Berlin, Germany
2  Department of Systems Biology, Harvard Medical School - 02115 Boston, MA, USA
3  Departament de Química Física, Universitat de Barcelona - 08028 Barcelona, Spain


received 5 October 2007; accepted in final form 27 November 2007; published February 2008
published online 31 December 2007

Abstract
We report on experiments with the photosensitive chlorine dioxide-iodine-malonic acid reaction (CDIMA) when forced with a random (spatiotemporally) distributed illumination. Acting on a mixed mode consisting of oscillating spots, close enough to the Hopf and Turing codimension-two bifurcation, we observe attenuation of oscillations while the spatial pattern is preserved. Numerical simulations confirm and extend these results. All together these observations point out to a larger vulnerability of the Hopf with respect to the Turing mode when facing noise of intermediate intensity and small correlation parameters.

PACS
05.40.Ca - Noise.
82.40.Ck - Pattern formation in reactions with diffusion, flow and heat transfer.
47.54.-r - Pattern selection; pattern formation.

© EPLA 2008