Volume 84, Number 5, December 2008
Article Number 58003
Number of page(s) 5
Section Interdisciplinary Physics and Related Areas of Science and Technology
Published online 12 December 2008
EPL, 84 (2008) 58003
DOI: 10.1209/0295-5075/84/58003

First results of high-resolution patterning by the ENEA laboratory-scale extreme ultraviolet projection lithography system

S. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra and A. Torre

ENEA Research Center of Frascati, FIM Department - P.O. Box 65, 00044 Frascati, Italy, EU

received 24 July 2008; accepted in final form 31 October 2008; published December 2008
published online 12 December 2008

We report the high-resolution patterning achieved by the laboratory-scale micro-exposure tool for extreme ultraviolet projection lithography realized at the ENEA Frascati Research Center in the frame of a National Project. Such a result obtained using a laser-produced-plasma source, a couple of twin ellipsoidal collectors and a low-cost Schwarzschild-type projection optics shows that it is possible to attain a nanometer-scale spatial resolution using relatively inexpensive projection optics.

81.16.Nd - Nanolithography.
85.40.Hp - Lithography, masks and pattern transfer.
52.38.Ph - X-ray, $\gamma$-ray, and particle generation.

© EPLA 2008