First results of high-resolution patterning by the ENEA laboratory-scale extreme ultraviolet projection lithography systemS. Bollanti, P. Di Lazzaro, F. Flora, L. Mezi, D. Murra and A. Torre
ENEA Research Center of Frascati, FIM Department - P.O. Box 65, 00044 Frascati, Italy, EU
received 24 July 2008; accepted in final form 31 October 2008; published December 2008
published online 12 December 2008
We report the high-resolution patterning achieved by the laboratory-scale micro-exposure tool for extreme ultraviolet projection lithography realized at the ENEA Frascati Research Center in the frame of a National Project. Such a result obtained using a laser-produced-plasma source, a couple of twin ellipsoidal collectors and a low-cost Schwarzschild-type projection optics shows that it is possible to attain a nanometer-scale spatial resolution using relatively inexpensive projection optics.
81.16.Nd - Nanolithography.
85.40.Hp - Lithography, masks and pattern transfer.
52.38.Ph - X-ray, -ray, and particle generation.
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