Volume 36, Number 4, November I 1996
|Page(s)||253 - 258|
|Section||Classical areas of phenomenology|
|Published online||01 September 2002|
Runaway growth in two-dimensional electrodeposition
Laboratoire de Physique de la Matière Condensée,
CNRS, Ecole Polytechnique,
91128 Palaiseau, France
2 Department of Chemical Engineering, University of New Hampshire, Durham, New-Hampshire 03824, USA
Accepted: 16 September 1996
We have investigated electrochemical deposition of copper along a very thin gold edge. Exploration of the transition between compact and branched morphologies reveals a faceted morphology, at very low current densities, which is composed of a pentagonal arrangement of twinned crystals. For higher current densities, repeated nucleation gives a tip-splitting regime. A transition between tip-splitting and side-branching morphology is obtained by inducing anisotropy on the substrate, in the form of microscopic teflon furrows. The growth speed of the different morphologies is very different.
PACS: 47.53.+n – Fractals / 68.70.+w – Whiskers and dendrites (growth, structure, and nonelectronic properties) / 81.15.Lm – Deposition from liquid phases (melts, solutions, and surface layers on liquids)
© EDP Sciences, 1996
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