Volume 42, Number 4, May II 1998
|Page(s)||389 - 394|
|Published online||01 September 2002|
Anisotropy and non-universality in kinetic roughening
Max-Planck Institute for Physics of Complex Systems,
Nönitzer Str. 38, D-01187 Dresden, Germany
2 PMMH Ecole Supérieure de Physique et Chimie Industrielles, 10, rue Vauquelin, 75231 Paris CEDEX 05, France
3 ENEA Research Center - Località Granatello, C.P. 32 80055 Portici, Napoli, Italy
Accepted: 30 March 1998
We introduce a new model for kinetic roughening which exhibits a non-universal behavior for the roughness exponent, in agreement with many experimental findings. The model, inspired by the chemical etching processes, takes explicitly into account the effect of anisotropy, say the dependence of the growth rule on the local environment conditions. The interplay between anisotropy and non-universality is investigated as well as the relationship with the known universality classes.
PACS: 05.70.Ln – Nonequilibrium thermodynamics, irreversible processes / 68.35.Ct – Interface structure and roughness / 61.43Hv – Fractals; macroscopic aggregates (including diffusion-limited aggregates)
© EDP Sciences, 1998
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