| Issue |
Europhys. Lett.
Volume 44, Number 1, October I 1998
|
|
|---|---|---|
| Page(s) | 57 - 61 | |
| Section | Condensed matter: structure, thermal and mechanical properties | |
| DOI | https://doi.org/10.1209/epl/i1998-00434-8 | |
| Published online | 01 September 2002 | |
Micro-Raman study of the factors limiting the 
phase formation in submicron patterns
1
INFM-Dipartimento di Scienza dei Materiali, Università di Milano, via Emanueli 15, I-20126 Milano, Italy
2
INFM-Laboratorio Materiali e Dispositivi per la Microelettronica, via C. Olivetti 2, I-20041 Agrate Brianza (MI ), Italy
3
SGS-Thomson Microelectronics, via C. Olivetti 2, I-20041 Agrate Brianza (MI ), Italy
Received:
4
February
1998
Accepted:
30
July
1998
A detailed micro-Raman analysis of the C49-C54 structural phase
transformation in a 
patterned film is reported. These
results emphasise that a reduced density of triple-grain boundaries,
considered to be the nucleation sites of the C54 phase, is not
sufficient to explain the observed difficulty to convert the C49 in
small areas. Other effects, such as the C54 effective nucleation
probability on a given nucleation centre and the C54 ability to
propagate through the film, play a key role in the C49-C54 conversion
process, and affect the transition temperature required for sub-micron
devices.
PACS: 68.35.Rh – Phase transitions and critical phenomena / 78.30.Er – Solid metals and alloys / 81.70.Fy – Nondestructive testing: optical methods
© EDP Sciences, 1998
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