| Issue |
Europhys. Lett.
Volume 46, Number 2, April II 1999
|
|
|---|---|---|
| Page(s) | 148 - 153 | |
| Section | Atomic and molecular physics | |
| DOI | https://doi.org/10.1209/epl/i1999-00237-5 | |
| Published online | 01 December 2003 | |
Polarization gradient light masks in atom lithography
Universität Konstanz, Fakultät für Physik
Optik Zentrum Konstanz, D-78457 Konstanz, Germany
Received:
8
December
1998
Accepted:
27
January
1999
In atom lithography, neutral atoms are focused by laser light to form a periodic pattern on a substrate. We have realized two-dimensional structuring of chromium on a silicon substrate employing a polarization gradient light mask with uniform intensity. The generated structures exhibit peak-to-peak distances below half the laser wavelength. The results are explained by a theoretical model which takes into account the magnetic substructure of the atomic transition employed and the influence of a static magnetic field.
PACS: 32.80.Pj – Optical cooling of atoms; trapping / 42.50.Vk – Mechanical effects of light on atoms, molecules, electrons, and ions
© EDP Sciences, 1999
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.