| Issue |
Europhys. Lett.
Volume 46, Number 5, June I 1999
|
|
|---|---|---|
| Page(s) | 589 - 594 | |
| Section | Atomic and molecular physics | |
| DOI | https://doi.org/10.1209/epl/i1999-00304-5 | |
| Published online | 01 September 2002 | |
How to use oxygen and atomic hydrogen to prepare atomically flat fcc Co(110) films
1
Institut für Grenzflächenforschung und Vakuumphysik
Forschungszentrum Jülich - D-52425 Jülich, Germany
2
Institut für Physikalische und Theoretische Chemie Wegelerstr. 12,
D-53113 Bonn, Germany
3
Institut für Experimentalphysik,
Johannes-Kepler-Universität Linz , Austria
Received:
25
February
1999
Accepted:
30
March
1999
It is shown that atomic hydrogen from a specially designed atomic beam source is well suited for removing chemisorbed oxygen from an fcc Co(110) film that has been grown on a Cu(110) substrate using oxygen as a surfactant. Exposing the oxygen-terminated Co surface to atomic hydrogen leads to a surface reaction which destroys the (3×1) ordered-O induced surface reconstruction of the Co film. Upon annealing at 380 K, the hydrogen remaining on the O-free Co surface can be completely desorbed. With this technique, it is possible for the first time to prepare about 15 monolayers thick, atomically-flat fcc Co(110) films.
PACS: 34.50.-s – Scattering of atoms, molecules, and ions / 68.35.Bs – Surface structure and topography / 82.40.Dm – Atomic and molecular beam reactions
© EDP Sciences, 1999
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