Volume 62, Number 2, April 2003
|Page(s)||278 - 284|
|Section||Interdisciplinary physics and related areas of science and technology|
|Published online||01 April 2003|
Evidence for strong Auger electron diffraction in thin metallic films
Institute of Physics and Physical Technology, Technical University
Clausthal D-38678 Clausthal-Zellerfeld, Germany
2 Department of Physics, University of South Africa P.O. Box 392, Pretoria 0003, South Africa
Corresponding author: firstname.lastname@example.org
Accepted: 20 February 2003
We deposited and films on a surface terminated with a pseudomorphic monolayer (ML). Instead of continuously decreasing, the -MVV (330) Auger signal received in normal emission from the ML increases for the coverage range of 1–2 of the deposited or . This increase leads to a -MVV (330) Auger signal even stronger than that coming from the uncovered substrate. We demonstrate that the forward focusing of the -MVV (330) Auger electrons by the growing or film is responsible for this effect. We subsequently show how this phenomenon can be used to determine the absolute thickness of the deposited films, making Auger electron diffraction more useful for film thickness determination than signal damping in Auger electron spectroscopy.
PACS: 82.80.Pv – Electron spectroscopy (X-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.) / 61.14.-x – Electron diffraction and scattering / 68.55.Jk – Structure and morphology; thickness; crystalline orientation and texture
© EDP Sciences, 2003
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