Volume 62, Number 4, May 2003
|Page(s)||519 - 525|
|Section||Condensed matter: structure, mechanical and thermal properties|
|Published online||01 May 2003|
Percolation-dependent reaction time in the etching of disordered solids
Centre de Mathématiques et de leurs
Applications, Ecole Normale Supérieure-CNRS
94140 Cachan, France
2 Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique-CNRS 91128 Palaiseau, France
Accepted: 13 March 2003
A prototype statistical model for the etching of a random solid is investigated in order to assess the influence of disorder and temperature on the dissolution kinetics. At low temperature, the kinetics is dominated by percolation phenomena, and the percolation threshold directly determines the reaction time. At high temperature, the fluctuations of the reaction rate are Gaussian, whereas at low temperature they exhibit a power law tail due to chemical avalanches. This is an example where microscopic disorder directly induces non-classical chemical kinetics.
PACS: 64.60.Ak – Renormalization-group, fractal, and percolation studies of phase transitions / 82.20.-w – Chemical kinetics and dynamics / 05.65.+b – Self-organized systems
© EDP Sciences, 2003
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