| Issue |
Europhys. Lett.
Volume 71, Number 5, September 2005
|
|
|---|---|---|
| Page(s) | 757 - 762 | |
| Section | Physics of gases, plasmas and electric discharges | |
| DOI | https://doi.org/10.1209/epl/i2004-10548-y | |
| Published online | 29 July 2005 | |
Enhanced diffusion of 
in aluminium
under low-energy ion bombardment
1
Institute “Ruder Bošković” - Zagreb, Croatia
2
Faculty of Mechanical Engineering and Naval Architecture - Zagreb, Croatia
Corresponding author: zdenko.sternberg@iskon.hr
Received:
29
November
2004
Accepted:
10
June
2005
Sputter deposition of copper on aluminium, under intense
bombardment of low-energy ions resulted in the formation of two
interfacial zones. The mean diffusion coefficient effective in
the formation of the first zone, 
, is
attributed to vacancy supersaturation. The results strongly
suggest that by supplying the necessary energy for the formation
of vacancies, the activation energy for diffusion can be reduced
to the level of the enthalpy of migration, provided lifetimes of
freely migrating defects are sufficiently long.
PACS: 52.40.Hf – Plasma-material interactions; boundary layer effects / 68.35.Fx – Diffusion; interface formation
© EDP Sciences, 2005
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