Volume 72, Number 6, December 2005
|Page(s)||915 - 921|
|Published online||23 November 2005|
EUV scanning transmission microscope operating with high-harmonic and laser plasma radiation
University of Applied Sciences Koblenz, RheinAhrCampus Remagen Institute for X-optics - Südallee 2, 53424 Remagen, Germany
2 Westfälische Wilhelms-Universität Münster, Physikalisches Institut Wilhelm-Klemm-Straße 10, 48149 Münster, Germany
3 Center for Nanotechnology - Gievenbecker Weg 11, 48149 Münster, Germany
Accepted: 21 October 2005
We present results of a compact scanning transmission microscope (CSTXM) operated with laser-produced high-order–harmonic (HH) and laser plasma (LIP) radiation. When using relatively broadband radiation of a HH source (3 harmonics) a resolution of is achieved with light. Pictures containing pixels with about 1000 photons per pixel are generated in less than 1.5 hours with a laser source and a dwell time of per pixel. Using a narrow-band emission line of a laser plasma source with the CSTXM structures of a test object were imaged at the laser plasma source with a dwell time of .
PACS: 07.85.Tt – X-ray microscopes / 41.50.+h – X-ray beams and X-ray optics / 42.65.Ky – Frequency conversion; harmonic generation, including higher-order harmonic generation
© EDP Sciences, 2005
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