Volume 84, Number 5, December 2008
|Number of page(s)||5|
|Section||Interdisciplinary Physics and Related Areas of Science and Technology|
|Published online||12 December 2008|
First results of high-resolution patterning by the ENEA laboratory-scale extreme ultraviolet projection lithography system
ENEA Research Center of Frascati, FIM Department - P.O. Box 65, 00044 Frascati, Italy, EU
Corresponding author: firstname.lastname@example.org
Accepted: 31 October 2008
We report the high-resolution patterning achieved by the laboratory-scale micro-exposure tool for extreme ultraviolet projection lithography realized at the ENEA Frascati Research Center in the frame of a National Project. Such a result obtained using a laser-produced-plasma source, a couple of twin ellipsoidal collectors and a low-cost Schwarzschild-type projection optics shows that it is possible to attain a nanometer-scale spatial resolution using relatively inexpensive projection optics.
PACS: 81.16.Nd – Nanolithography / 85.40.Hp – Lithography, masks and pattern transfer / 52.38.Ph – X-ray, γ-ray, and particle generation
© EPLA, 2008
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