Volume 110, Number 4, May 2015
|Number of page(s)||6|
|Section||Atomic, Molecular and Optical Physics|
|Published online||12 June 2015|
Spatial phase-resolved optical emission spectroscopy for understanding plasma etching uniformity
1 BioPlasma Research group, Dublin Institute of Technology - Sackville Place, Dublin 1, Ireland
2 Faculty of Physics, University of Belgrade - P.O.B. 368, Belgrade, Serbia
3 School of Chemical Engineering, UNSW - Sydney, Australia
Received: 15 January 2015
Accepted: 22 May 2015
Plasma chemistry of an oxygen-argon discharge in an electron cyclotron resonance (ECR) plasma etcher with a SiO2 wafer is observed. The study involves: Phase-resolved optical emission spectroscopy (PROES) of neutral atomic argon (Ar I) and oxygen (O I) spectral lines, spectroscopic ellipsometry of the wafer and a magnetic-field measurement of the ECR etcher's electro-magnet. Spatial PROES results together with the ellipsometry and magnetic-field measurements are used to assess the plasma etching uniformity of the SiO2 wafer. To evaluate the cross-dependences of the measured outputs for a wide range of process parameters, a design-of-experiment approach is taken. Spatial PROES of the oxygen atom shows a different spectral radiation pattern for the oxygen from the gas phase and those from the solid phase due to surface etching.
PACS: 32.70.-n – Intensities and shapes of atomic spectral lines / 52.70.-m – Plasma diagnostic techniques and instrumentation / 81.65.Cf – Surface cleaning, etching, patterning
© EPLA, 2015
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