Europhys. Lett., 62 (6) , pp. 855-861 (2003)
Substructure formation during pattern transposition from substrate into polymer blend filmP. Cyganik1, A. Budkowski1, U. Steiner2, J. Rysz1, A. Bernasik3, S. Walheim4, Z. Postawa1 and J. Raczkowska1
1 M. Smoluchowski Institute of Physics, Jagellonian University Reymonta 4, 30-059 Kraków, Poland
2 Department of Polymer Chemistry, University of Groningen 9747 AG Groningen, The Netherlands
3 Faculty of Physics and Nuclear Techniques, University of Mining and Metallurgy Reymonta 23, 30-059 Kraków, Poland
4 Institut für Nanotechnologie, Forschungszentrum Karlsruhe Postfach 3640, 76021 Karlsruhe, Germany
(Received 19 February 2003; accepted in final form 29 April 2003)
A chemical pattern on a substrate is transposed into thin films of a ternary polymer blend during spin-casting from a common solvent. One of the blend components intercalates at interfaces between the other two phases to reduce their interfacial energy. As a result, an extensive substructure is formed, in addition to domains with pattern periodicity . Morphologies with well-ordered lateral domains are created not only when the inherent scale of the phase domains R is comparable to (as observed previously) but also for , extending pattern transposition to smaller length scales.
61.41.+e - Polymers, elastomers, and plastics.
64.75.+g - Solubility, segregation, and mixing; phase separation.
68.55.-a - Thin film structure and morphology.
© EDP Sciences 2003