Issue
EPL
Volume 81, Number 4, February 2008
Article Number 46001
Number of page(s) 5
Section Condensed Matter: Structural, Mechanical and Thermal Properties
DOI http://dx.doi.org/10.1209/0295-5075/81/46001
Published online 10 January 2008
EPL, 81 (2008) 46001
DOI: 10.1209/0295-5075/81/46001

Cubic-on-cubic growth of a MgO(001) thin film prepared on Si(001) substrate at low ambient pressure by the sputtering method

S. Kaneko1, H. Funakubo2, T. Kadowaki1, Y. Hirabayashi1 and K. Akiyama1

1  Kanagawa Industrial Technology Center, Kanagawa Prefectural Government 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan
2  Department of Innovative and Engineered Materials, Tokyo Institute of Technology 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8502 Japan


received 5 October 2007; accepted in final form 4 December 2007; published February 2008
published online 10 January 2008

Abstract
Magnesium oxide (MgO) films were prepared on a Si(001) substrate by the rf sputter- ing method at low ambient pressure using a metal target. The X-ray diffraction verified the epi- taxial growth of MgO(001) with a cubic-on-cubic arrangement despite the large lattice mismatch between MgO(100) and Si(100), and contractions of the unit cell along both the out-of-plane and in-plane directions. Epitaxial growth is described as a domain epitaxial relation with a domain mismatch consisting of (k$\times$$\ell$) lattice units of the Si substrate and (m$\times$n) ones of the MgO film. To visualize the domain mismatch with combinations of k, $\ell$, m and n, coherent strains were depicted on polar coordinates. The domain mismatch was estimated as a small value, which was further decreased by the contraction of the unit cell in the epitaxial MgO film.

PACS
68.55.-a - Thin film structure and morphology.
61.10.-i - X-ray diffraction and scattering.
81.05.Je - Ceramics and refractories (including borides, carbides, hydrides, nitrides, oxides, and silicides).

© EPLA 2008