Issue
EPL
Volume 82, Number 5, June 2008
Article Number 55001
Number of page(s) 5
Section Physics of Gases, Plasmas and Electric Discharges
DOI http://dx.doi.org/10.1209/0295-5075/82/55001
Published online 22 May 2008
EPL, 82 (2008) 55001
DOI: 10.1209/0295-5075/82/55001

Multicapillary cathode controlled by a ferroelectric plasma source

J. Z. Gleizer, Y. Hadas and Ya. E. Krasik

Physics Department, Technion - 32000 Haifa, Israel

fnkrasik@physics.technion.ac.il

received 4 March 2008; accepted in final form 14 April 2008; published June 2008
published online 22 May 2008

Abstract
We present results of high-current microsecond and sub-microsecond duration electron beam generation in a $\sim 200\,{\rm kV}$ diode with a multicapillary dielectric cathode (MCDC) assisted by a ferroelectric plasma source (FPS). Electron beam current densities are achieved up to $40\,{\rm A}/{\rm cm}^{2}$. It was shown that the operation of the MCDC is determined by the parameters of the plasma flow generated by the FPS. Also, it was found that the high resistivity of the plasma produced inside the capillaries allows effective de-coupling of individual capillary plasma discharges which results in uniform electron beam generation.

PACS
52.50.Dg - Plasma sources.
84.70.+p - High-current and high-voltage technology: power systems; power transmission lines and cables.
52.25.Tx - Emission, absorption, and scattering of particles.

© EPLA 2008