Multicapillary cathode controlled by a ferroelectric plasma sourceJ. Z. Gleizer, Y. Hadas and Ya. E. Krasik
Physics Department, Technion - 32000 Haifa, Israel
received 4 March 2008; accepted in final form 14 April 2008; published June 2008
published online 22 May 2008
We present results of high-current microsecond and sub-microsecond duration electron beam generation in a diode with a multicapillary dielectric cathode (MCDC) assisted by a ferroelectric plasma source (FPS). Electron beam current densities are achieved up to . It was shown that the operation of the MCDC is determined by the parameters of the plasma flow generated by the FPS. Also, it was found that the high resistivity of the plasma produced inside the capillaries allows effective de-coupling of individual capillary plasma discharges which results in uniform electron beam generation.
52.50.Dg - Plasma sources.
84.70.+p - High-current and high-voltage technology: power systems; power transmission lines and cables.
52.25.Tx - Emission, absorption, and scattering of particles.
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