| Issue |
Europhys. Lett.
Volume 36, Number 5, November II 1996
|
|
|---|---|---|
| Page(s) | 355 - 360 | |
| Section | Atomic, molecular and optical physics | |
| DOI | https://doi.org/10.1209/epl/i1996-00235-7 | |
| Published online | 01 September 2002 | |
Temperature and coverage control of O2 photofragmentation on Si(111)7 × 7
1
Laboratoire pour l'Utilisation du Rayonnement
Electromagnétique (LURE), Bâtiment 209 D, Université de
Paris-Sud, F-91405 Orsay Cedex, France
2
Laboratoire de Photophysique Moléculaire CNRS (LPPM),
Bâtiment 213, Université de Paris-Sud, F-91405 Orsay Cedex, France
Received:
8
July
1996
Accepted:
3
October
1996
The photofragmentation study of 
adsorbed on 
shows that two markedly different regimes can be selected by varying the sample
temperature and the 
coverage. At room temperature the
photofragmentation is essentially dominated by direct processes whereas at low
temperature (30 K) the photofragmentation evolves from indirect to direct processes when
increasing the coverage from 0.04 to 0.2 L. These effects are
tentatively assigned to the temperature and coverage dependence of the
adsorption sites of on .
PACS: 33.80.Eh – Autoionization, photoionization, and photodetachment / 68.55.-a – Thin film growth, structure, and epitaxy / 79.70.+q – Field emission, ionization, evaporation, and desorption
© EDP Sciences, 1996
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.