Volume 36, Number 5, November II 1996
|Page(s)||355 - 360|
|Section||Atomic, molecular and optical physics|
|Published online||01 September 2002|
Temperature and coverage control of O2 photofragmentation on Si(111)7 × 7
Laboratoire pour l'Utilisation du Rayonnement
Electromagnétique (LURE), Bâtiment 209 D, Université de
Paris-Sud, F-91405 Orsay Cedex, France
2 Laboratoire de Photophysique Moléculaire CNRS (LPPM), Bâtiment 213, Université de Paris-Sud, F-91405 Orsay Cedex, France
Accepted: 3 October 1996
The photofragmentation study of adsorbed on shows that two markedly different regimes can be selected by varying the sample temperature and the coverage. At room temperature the photofragmentation is essentially dominated by direct processes whereas at low temperature (30 K) the photofragmentation evolves from indirect to direct processes when increasing the coverage from 0.04 to 0.2 L. These effects are tentatively assigned to the temperature and coverage dependence of the adsorption sites of on .
PACS: 33.80.Eh – Autoionization, photoionization, and photodetachment / 68.55.-a – Thin film growth, structure, and epitaxy / 79.70.+q – Field emission, ionization, evaporation, and desorption
© EDP Sciences, 1996
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