Volume 62, Number 6, June 2003
|Page(s)||855 - 861|
|Section||Condensed matter: structure, mechanical and thermal properties|
|Published online||01 June 2003|
Substructure formation during pattern transposition from substrate into polymer blend film
M. Smoluchowski Institute of Physics, Jagellonian University Reymonta 4, 30-059 Kraków, Poland
2 Department of Polymer Chemistry, University of Groningen 9747 AG Groningen, The Netherlands
3 Faculty of Physics and Nuclear Techniques, University of Mining and Metallurgy Reymonta 23, 30-059 Kraków, Poland
4 Institut für Nanotechnologie, Forschungszentrum Karlsruhe Postfach 3640, 76021 Karlsruhe, Germany
Corresponding author: email@example.com
Accepted: 29 April 2003
A chemical pattern on a substrate is transposed into thin films of a ternary polymer blend during spin-casting from a common solvent. One of the blend components intercalates at interfaces between the other two phases to reduce their interfacial energy. As a result, an extensive substructure is formed, in addition to domains with pattern periodicity λ. Morphologies with well-ordered lateral domains are created not only when the inherent scale of the phase domains R is comparable to λ (as observed previously) but also for , extending pattern transposition to smaller length scales.
PACS: 61.41.+e – Polymers, elastomers, and plastics / 64.75.+g – Solubility, segregation, and mixing; phase separation / 68.55.-a – Thin film structure and morphology
© EDP Sciences, 2003
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