| Issue |
EPL
Volume 82, Number 4, May 2008
|
|
|---|---|---|
| Article Number | 47001 | |
| Number of page(s) | 3 | |
| Section | Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties | |
| DOI | https://doi.org/10.1209/0295-5075/82/47001 | |
| Published online | 06 May 2008 | |
Electron transport in a slot-gate Si MOSFET
1
Jack and Pearl Resnick Institute of Advanced Technology, Department of Physics, Bar-Ilan University Ramat-Gan 52900, Israel
2
Paul-Drude Institut für Festkörperelektronik - Hausvogteiplatz 5-7, 10117, Berlin, Germany, EU
3
Physics Department, Northeastern University - Boston, MA 02115, USA
Corresponding author: shlimai@mail.biu.ac.il
Received:
16
December
2007
Accepted:
25
March
2008
The transversal and longitudinal resistance in the quantum Hall effect regime was measured in a Si MOSFET sample in which a slot-gate allows one to vary the electron density and filling factor in different parts of the sample. In case of unequal gate voltages, the longitudinal resistances on the opposite sides of the sample differ from each other because the originated Hall voltage difference is added to the longitudinal voltage only on one side depending on the gradient of the gate voltages and the direction of the external magnetic field. After subtracting the Hall voltage difference, the increase in longitudinal resistance is observed when electrons on the opposite sides of the slot occupy Landau levels with different spin orientations.
PACS: 73.43.-f – Quantum Hall effects / 72.20.-i – Conductivity phenomena in semiconductors and insulators / 72.25.Rb – Spin relaxation and scattering
© EPLA, 2008
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