Volume 82, Number 5, June 2008
|Number of page(s)||5|
|Section||Physics of Gases, Plasmas and Electric Discharges|
|Published online||22 May 2008|
Multicapillary cathode controlled by a ferroelectric plasma source
Physics Department, Technion - 32000 Haifa, Israel
Corresponding author: firstname.lastname@example.org
Accepted: 14 April 2008
We present results of high-current microsecond and sub-microsecond duration electron beam generation in a diode with a multicapillary dielectric cathode (MCDC) assisted by a ferroelectric plasma source (FPS). Electron beam current densities are achieved up to . It was shown that the operation of the MCDC is determined by the parameters of the plasma flow generated by the FPS. Also, it was found that the high resistivity of the plasma produced inside the capillaries allows effective de-coupling of individual capillary plasma discharges which results in uniform electron beam generation.
PACS: 52.50.Dg – Plasma sources / 84.70.+p – High-current and high-voltage technology: power systems; power transmission lines and cables / 52.25.Tx – Emission, absorption, and scattering of particles
© EPLA, 2008
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