Volume 115, Number 4, August 2016
|Number of page(s)||6|
|Section||Atomic, Molecular and Optical Physics|
|Published online||14 September 2016|
Slow highly charged ion induced nanopit formation on the KCl(001) surface
Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research Bautzner Landstr. 400, 01328 Dresden, Germany
Received: 6 July 2016
Accepted: 25 August 2016
We report on nanostructuring of the KCl(001) surface induced by the individual impact of slow highly charged ions. Samples were irradiated with Xe ions with charge states of Q = 15 to 40 at kinetic energies from 1.7 to 160 keV. The formation of nanopits at the virgin surface is observed and attributed to a defect-mediated desorption process involving the removal of up to 2000 surface atoms per incident ion. The depth of the produced pits is shallow, but not limited to the first monolayer. From the variation of the ion parameters (charge state and kinetic energy) we derive a phase diagram for the structuring of the KCl(001) surface with highly charged ions.
PACS: 34.35.+a – Interactions of atoms and molecules with surfaces / 61.72.J- – Point defects and defect clusters / 79.20.Rf – Atomic, molecular, and ion beam impact and interactions with surfaces
© EPLA, 2016
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