Volume 133, Number 1, January 2021
|Number of page(s)||5|
|Section||Condensed Matter: Electronic Structure, Electrical, Magnetic and Optical Properties|
|Published online||05 March 2021|
Evidence for weak-antilocalization–weak-localization crossover and metal-insulator transition in CaCu3Ru4O12 thin films
1 Institute of Physics - Sachivalaya Marg, Bhubaneswar, 751005, India
2 Homi Bhabha National Institute - Anushakti Nagar, Mumbai, 400085, India
3 Department of Physics, Indian Institute of Science - Bangalore, 560012, India
4 Condensed Matter Theory and Computational Lab, Department of Physics, Indian Institute of Technology Madras, India
Received: 29 August 2020
Accepted: 7 December 2020
Artificial confinement of electrons by tailoring the layer thickness has turned out to be a powerful tool to harness control over competing phases in nano-layers of complex oxides. We investigate the effect of dimensionality on transport properties of d-electron–based heavy-fermion metal CaCu3Ru4O12. Transport behavior evolves from metallic to localized regime upon reducing thickness and a metal-insulator transition is observed below 3 nm film thickness for which sheet resistance crosses , the quantum resistance in 2D. Magnetotransport study reveals a strong interplay between inelastic and spin-orbit scattering lengths upon reducing thickness, which results in weak-antilocalization (WAL) to weak-localization (WL) crossover in magnetoconductance.
PACS: 73.50.-h – Electronic transport phenomena in thin films / 71.27.+a – Strongly correlated electron systems; heavy fermions / 81.15.-z – Methods of deposition of films and coatings; film growth and epitaxy
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