Europhys. Lett.
Volume 72, Number 3, November 2005
Page(s) 390 - 395
Section Physics of gases, plasmas and electric discharges
Published online 28 September 2005
Europhys. Lett., 72 (3), pp. 390-395 (2005)
DOI: 10.1209/epl/i2005-10243-7

Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge

P. Vasina1, 2, M. Mesko1, 2, M. Ganciu1, 3, J. Bretagne1, C. Boisse-Laporte1, L. de Poucques1 and M. Touzeau1

1  Laboratoire de Physique des Gaz et des Plasmas, Bat. 210, Université Paris-Sud 91405, Orsay Cedex, France
2  Department of Physical Electronics, Faculty of Science, Masaryk University Kotlarská 2, 61137, Brno, Czech Republic
3  National Institute of Laser, Plasma and Radiation Physics MG 36, Magurele, Bucharest, Romania

received 25 July 2005; accepted in final form 5 September 2005
published online 28 September 2005

A high-power pulsed-magnetron discharge (several $\un{kW/cm^2}$) is described. It operates at pulse duration of the order of few $\mu$s, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buffer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few $\mu$s which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to $10\un{A/{cm^2}}$ induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion flux to the substrate. Preliminary result on Cu deposit in trenches is reported.

51.50.+v - Electrical properties (ionization, breakdown, electron and ion mobility, etc.).
52.50.Dg - Plasma sources.
52.77.-j - Plasma application.

© EDP Sciences 2005