Reduction of transient regime in fast preionized high-power pulsed-magnetron dischargeP. Vasina1, 2, M. Mesko1, 2, M. Ganciu1, 3, J. Bretagne1, C. Boisse-Laporte1, L. de Poucques1 and M. Touzeau1
1 Laboratoire de Physique des Gaz et des Plasmas, Bat. 210, Université Paris-Sud 91405, Orsay Cedex, France
2 Department of Physical Electronics, Faculty of Science, Masaryk University Kotlarská 2, 61137, Brno, Czech Republic
3 National Institute of Laser, Plasma and Radiation Physics MG 36, Magurele, Bucharest, Romania
received 25 July 2005; accepted in final form 5 September 2005
published online 28 September 2005
A high-power pulsed-magnetron discharge (several ) is described. It operates at pulse duration of the order of few s, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buffer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few s which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion flux to the substrate. Preliminary result on Cu deposit in trenches is reported.
51.50.+v - Electrical properties (ionization, breakdown, electron and ion mobility, etc.).
52.50.Dg - Plasma sources.
52.77.-j - Plasma application.
© EDP Sciences 2005