Issue |
Europhys. Lett.
Volume 42, Number 3, May I 1998
|
|
---|---|---|
Page(s) | 283 - 288 | |
Section | Condensed matter: structure, thermal and mechanical properties | |
DOI | https://doi.org/10.1209/epl/i1998-00243-1 | |
Published online | 01 September 2002 |
X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films
1
Synchrotron Radiation Laboratory, Institute of High Energy
Physics,
Chinese Academy of Sciences, P.O. Box 918(2-7), Beijing, 100039, PRC
2
Institute of Physics, Chinese Academy of Sciences, Beijing,
100080, PRC
Corresponding author: wangjun@bepc5.ihep.ac.cn
Received:
17
December
1997
Accepted:
13
March
1998
An X-ray reflectivity (XR) study of the dynamic evolution
of the film surface was carried out for molybdenum (Mo) sputter-deposited
onto silicon substrates. The Mo-air interface width
grows with time, and exhibits a power law behavior. The growth exponent
β is
found to be 0.42. The time-invariant self-affine behavior on
the short-range scale has also been observed, and is consistent with
the dynamic scaling theory. The roughness exponent α is found to be
. Scanning tunneling microscopy (STM) was also used to
characterize the surface and showed good agreement with the XR measurements.
PACS: 68.55.-a – Thin film structure and morphology / 61.10.-i – X-ray diffraction and scattering / 68.35.Ct – Interface structure and roughness
© EDP Sciences, 1998
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