Volume 42, Number 3, May I 1998
|Page(s)||283 - 288|
|Section||Condensed matter: structure, thermal and mechanical properties|
|Published online||01 September 2002|
X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films
Synchrotron Radiation Laboratory, Institute of High Energy
Chinese Academy of Sciences, P.O. Box 918(2-7), Beijing, 100039, PRC
2 Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, PRC
Corresponding author: firstname.lastname@example.org
Accepted: 13 March 1998
An X-ray reflectivity (XR) study of the dynamic evolution of the film surface was carried out for molybdenum (Mo) sputter-deposited onto silicon substrates. The Mo-air interface width grows with time, and exhibits a power law behavior. The growth exponent β is found to be 0.42. The time-invariant self-affine behavior on the short-range scale has also been observed, and is consistent with the dynamic scaling theory. The roughness exponent α is found to be . Scanning tunneling microscopy (STM) was also used to characterize the surface and showed good agreement with the XR measurements.
PACS: 68.55.-a – Thin film structure and morphology / 61.10.-i – X-ray diffraction and scattering / 68.35.Ct – Interface structure and roughness
© EDP Sciences, 1998
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