Volume 42, Number 3, May I 1998
|Page(s)||283 - 288|
|Section||Condensed matter: structure, thermal and mechanical properties|
|Published online||01 September 2002|
X-ray reflectivity and scanning-tunneling-microscopy study of surface roughness scaling of molybdenum films
Synchrotron Radiation Laboratory, Institute of High Energy
Chinese Academy of Sciences, P.O. Box 918(2-7), Beijing, 100039, PRC
2 Institute of Physics, Chinese Academy of Sciences, Beijing, 100080, PRC
Corresponding author: email@example.com
Accepted: 13 March 1998
An X-ray reflectivity (XR) study of the dynamic evolution of the film surface was carried out for molybdenum (Mo) sputter-deposited onto silicon substrates. The Mo-air interface width grows with time, and exhibits a power law behavior. The growth exponent β is found to be 0.42. The time-invariant self-affine behavior on the short-range scale has also been observed, and is consistent with the dynamic scaling theory. The roughness exponent α is found to be . Scanning tunneling microscopy (STM) was also used to characterize the surface and showed good agreement with the XR measurements.
PACS: 68.55.-a – Thin film structure and morphology / 61.10.-i – X-ray diffraction and scattering / 68.35.Ct – Interface structure and roughness
© EDP Sciences, 1998
Current usage metrics show cumulative count of Article Views (full-text article views including HTML views, PDF and ePub downloads, according to the available data) and Abstracts Views on Vision4Press platform.
Data correspond to usage on the plateform after 2015. The current usage metrics is available 48-96 hours after online publication and is updated daily on week days.
Initial download of the metrics may take a while.