| Issue |
Europhys. Lett.
Volume 56, Number 5, December 2001
|
|
|---|---|---|
| Page(s) | 676 - 682 | |
| Section | Physics of gases, plasmas and electric discharges | |
| DOI | https://doi.org/10.1209/epl/i2001-00573-x | |
| Published online | 01 December 2003 | |
Krypton as stopper for ions and small debris in laser plasma sources
1
ENEA, Divisione Fisica Applicata, Centro Ricerche Frascati C.P.
65, 00044 Frascati, Roma, Italy
2
EL. EN. Spa - Via Baldanzese 17, 50041 Calenzano (FI), Italy
Received:
19
April
2001
Accepted:
14
September
2001
A preliminary theoretical and experimental demonstration of the
successful use of krypton as stopper for ions and small debris
) in laser plasma sources is discussed. In
particular, for applications to projection micro-lithography at
-90
, an ions rejection by almost 2 orders of
magnitude is obtained at a 
pressure compatible for more
than 80% transmission of the EUV radiation.
PACS: 52.50.Dg – Plasma sources / 52.50.Jm – Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.) / 81.16.Nd – Nanolithography
© EDP Sciences, 2001
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