Volume 56, Number 5, December 2001
|Page(s)||676 - 682|
|Section||Physics of gases, plasmas and electric discharges|
|Published online||01 December 2003|
Krypton as stopper for ions and small debris in laser plasma sources
ENEA, Divisione Fisica Applicata, Centro Ricerche Frascati C.P.
65, 00044 Frascati, Roma, Italy
2 EL. EN. Spa - Via Baldanzese 17, 50041 Calenzano (FI), Italy
Accepted: 14 September 2001
A preliminary theoretical and experimental demonstration of the successful use of krypton as stopper for ions and small debris ) in laser plasma sources is discussed. In particular, for applications to projection micro-lithography at -90, an ions rejection by almost 2 orders of magnitude is obtained at a pressure compatible for more than 80% transmission of the EUV radiation.
PACS: 52.50.Dg – Plasma sources / 52.50.Jm – Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.) / 81.16.Nd – Nanolithography
© EDP Sciences, 2001
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