Volume 72, Number 3, November 2005
|Page(s)||390 - 395|
|Section||Physics of gases, plasmas and electric discharges|
|Published online||28 September 2005|
Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge
Laboratoire de Physique des Gaz et des Plasmas, Bat. 210, Université Paris-Sud 91405, Orsay Cedex, France
2 Department of Physical Electronics, Faculty of Science, Masaryk University Kotlarská 2, 61137, Brno, Czech Republic
3 National Institute of Laser, Plasma and Radiation Physics MG 36, Magurele, Bucharest, Romania
Accepted: 5 September 2005
A high-power pulsed-magnetron discharge (several ) is described. It operates at pulse duration of the order of few μs, significantly shorter than in usual similar devices. The breakdown delay was reduced by using a low-current DC preionization. The study was performed for Cu target in Ar and He buffer gases by optical emission spectroscopy and electrical measurements. Saturation magnetron current is reached in a few μs which permits to shorten the pulse duration avoiding arc formation. Unusual high current density up to induces very fast transition toward the stable self-sputtering regime. High plasma density favours high ion flux to the substrate. Preliminary result on Cu deposit in trenches is reported.
PACS: 51.50.+v – Electrical properties (ionization, breakdown, electron and ion mobility, etc.) / 52.50.Dg – Plasma sources / 52.77.-j – Plasma application
© EDP Sciences, 2005
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