Volume 88, Number 2, October 2009
|Number of page(s)||6|
|Section||Interdisciplinary Physics and Related Areas of Science and Technology|
|Published online||06 November 2009|
Heteroepitaxial sputtered Ge on Si (100): Nanostructure and interface morphology
CoreCom - via G. Colombo, 81, 20133 Milano, Italy, EU
2 Research Institute for Technical Physics and Materials Science - Konkoly-Thege M. út 29-33, H-1121 Budapest, Hungary, EU
3 MDM National Laboratory CNR-INFM - via C. Olivetti, 2, 20041 Agrate Brianza (MI), Italy, EU
4 Politecnico di Milano, Department of Electronics and Information - via Ponzio, 34-5, 20133 Milano, Italy, EU
5 Politecnico di Milano, Department of Energy - via Ponzio, 34-3, 20133 Milano, Italy, EU
Corresponding author: firstname.lastname@example.org
Accepted: 6 October 2009
Epitaxial growth of Ge thin films onto (100) silicon by DC-Pulsed Magnetron Sputtering was realized and proved by X-ray and electron diffraction. Transmission and high-resolution electron microscopy across the interface region directly confirmed a high degree of epitaxy and show that planar defects and threading dislocations are the relevant lattice imperfections. Electron microscopy shows that a post-deposition rapid thermal annealing process, up to 673 K, is effective to defect annihilation. The films grow single crystalline, slightly misoriented, below 0.1 degrees. A weak roughness around 0.6 nm, was measured both at the Ge-Si interface and at the film surface. The Ge films grown onto n-type Si show the rectifying electrical behaviour typical of p-type semiconductors.
PACS: 81.15.Cd – Deposition by sputtering / 52.77.Dq – Plasma-based ion implantation and deposition / 68.37.Lp – Transmission electron microscopy (TEM)
© EPLA, 2009
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