Volume 77, Number 4, February 2007
|Number of page(s)||5|
|Section||Physics of Gases, Plasmas and Electric Discharges|
|Published online||02 February 2007|
Ion flux characteristics in high-power pulsed magnetron sputtering discharges
Department of Physics, University of West Bohemia - Univerzitní 22, 30614 Plzeň, Czech Republic
Accepted: 12 December 2006
High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to . Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to ) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).
PACS: 52.50.Dg – Plasma sources / 52.70.-m – Plasma diagnostic techniques and instrumentation / 52.77.-j – Plasma applications
© Europhysics Letters Association, 2007
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